DigitalCommons@University of Nebraska - Lincoln - Xiang Gao, Jeff Hale, Scott Heckens, and John A. Woollam: Studies of metallic multilayer structures, optical properties, and oxidation using <i>in situ</i> spectroscopic ellipsometry

Electrical Engineering, Department of

Faculty Publications from the Department of Electrical Engineering

Title

Studies of metallic multilayer structures, optical properties, and oxidation using in situ spectroscopic ellipsometry

Authors

Xiang Gao, University of Nebraska - Lincoln
Jeff Hale, J. A. Woollam Co., Inc., Lincoln, Nebraska
Scott Heckens, University of Nebraska - Lincoln
John A. Woollam, University of Nebraska - Lincoln

Document Type

Article

Date of this Version

March 1998

Comments

Abstract

In situ spectroscopic ellipsometry (SE) has been successfully used to accurately measure sputter deposition rates and optical constants of un-oxidized metal layers and to control the growth of magnetic multilayers. The structures include [Co/Cu] _n , [Co/Au] _n , [Co/Ni] _n , [Co/Pd] _n and [Co/Pd/ Au] _n . Layer thickness precision is better than ±0.05 nm for layer thicknesses in the range of 0.2 nm to 10 nm. Closed-loop feedback control of layer thickness is also demonstrated. Good consistency was obtained by comparing the in situ SE results to x-ray diffraction measurements. Dynamic oxidation studies of [Co/Au] _n and [Co/Ni] _n multilayer structures are also presented.