SELECTIVE AREA CHEMICAL VAPOR DEPOSITION OF CHROMIUM OXIDES

Authors

Ruihua Cheng, University of Nebraska-Lincoln
C.N. Borca, University of Nebraska-Lincoln
Peter A. Dowben, University of Nebraska-LincolnFollow

Date of this Version

May 2000

Comments

Published in Mat. Res. Soc. Symp. Proc. Vol. 614. © 2000 Materials Research Society. Permission to use.

Abstract

We demonstrate that two-phase CrO₂ and Cr₂O₃ thin films can be grown by using selective organometallic chemical vapor deposition through the oxidation of Cr(CO) ₆ in an oxygen environment. While the magnetization measurements show that both chromium oxides are present, the relative weight of each phase depends on the oxygen partial pressure. Changes of the Curie temperature, T_c, and the saturation magnetization field may be possible by controlling the stoichiometry.