Oxidation of metals at the chromium oxide interface

Authors

• Ruihua Cheng, University of Nebraska-Lincoln
• C.N. Borca, University of Nebraska-Lincoln
• N. Pilet, University of Nebraska-Lincoln
• Bo Xu, University of Nebraska-Lincoln
• Lu Yuan, University of Nebraska-LincolnFollow
• Bernard Doudin, University of Nebraska-LincolnFollow
• Sy_Hwang Liou, University of Nebraska-LincolnFollow
• Peter A. Dowben, University of Nebraska-LincolnFollow

Document Type

Article

Date of this Version

9-9-2002

Comments

Published Applied Physics Letters 81 (2002) 2109-2111. Permission to use.

Abstract

Metal thin-film deposition, over the Cr₂O₃ surface of CrO₂ thin-film substrates, exhibits a redox reaction at the interface. The transition metal forms an oxide in combination with the reduction of the near-surface chromium oxide to Cr₂O₃ . The insulating barrier layer Cr₂O₃ increases with the formation of Pb₃ O₄ in Pb/Cr₂O₃ /CrO₂ and CoO in Co/Cr₂O₃ /CrO₂ junctions, respectively.