Thin crystalline functional group copolymer poly(vinylidene fluoride–trifluoroethylene) film patterning using synchrotron radiation

Authors

Jaewu Choi, University of Nebraska-LincolnFollow
H.M. Manohara, University of Nebraska-Lincoln
Eizi Morikawa, University of Nebraska-LincolnFollow
P.T. Sprunger, University of Nebraska-Lincoln
Peter A. Dowben, University of Nebraska-LincolnFollow
S.P. Palto, Institute of Crystallography of the Russian Academy of Sciences, Moscow, Russia

Date of this Version

1-17-2000

Comments

Published Appl. Physics Letters 76 (2000) 381-383. Permission to use.

Abstract

The photodegradation mechanism due to synchrotron radiation exposure of crystalline poly[vinylidene fluoride–trifluoroetylene, P(VDF–TrFE)] copolymer thin films has been studied with ultraviolet photoemission spectroscopy (UPS) and mass spectroscopy. Upon increasing exposure to x-ray white light (h ν≤1000 eV), UPS measurements reveal that substantial chemical modifications occur in P(VDF–TrFE) 5 monolayer films, including the emergence of new valence band features near the Fermi level, indicating a semimetallic photodegradeted product. The photodetached fragments of the copolymer consist mainly of H₂, HF, CHF, CH₂. This x-ray exposure study demonstrates that P(VDF–TrFE) films, possessing unique technologically important properties, can be directly patterned by x-ray lithographic processes. ©2000 American Institute of Physics.