Selective adsorption of metallocenes on clean and chemically modified Si(111) surfaces

Authors

• J.-L. Lin, University of Wisconsin-Madison
• H. Rauscher, University of Wisconsin-Madison
• A. Kirakosian, University of Wisconsin-Madison
• F.J. Himpsel, University of Wisconsin-Madison
• Peter A. Dowben, University of Nebraska-LincolnFollow

Document Type

Article

Date of this Version

November 1999

Comments

Published J. Applied Physics 86 (1999) 5492-5496. Permission to use.

Abstract

Metallocene adsorption on clean Si(111) and CaF₂/CaF₁/Si(111) substrates has been investigated with scanning tunneling microscopy. The surface chemical composition is found to strongly change the adsorption site selectivity, leading to an enhanced edge selectivity on modified substrates. Templates with well-defined local chemical reactivity have been created via self-assembly. The selective adsorption of metallocenes on such tailored substrates facilitates patterning ordered arrays of magnetic nanowires and stripes on the single digit nanometer scale. ©1999 American Institute of Physics.