Finite size scaling in the thin film limit

Authors

C. Waldfield, University of Nebraska-Lincoln
D. Welipitiya, University of Nebraska-Lincoln
T. McAvoy, University of Nebraska-Lincoln
Peter A. Dowben, University of Nebraska-LincolnFollow
Elio Vescovo, Brookhaven National LaboratoryFollow

Date of this Version

6-1-1998

Comments

Published J. Appl. Phys. 83 (1998) 7246-7248. Permission to use.

Abstract

The thickness dependent spin-polarized electronic structure of strained thin and ultrathin films of Gd is characterized by a distinct change in the critical exponent λ in the formalism of finite size scaling. The reduced critical exponent in the ultrathin films can be correlated to the increased dominance of the surface magnetic structure and the increasing paramagnetic-like behavior of the bulk. ©1998 American Institute of Physics.