Fabrication of large arrays of micron-scale magnetic features by selective area organometallic chemical vapor deposition

Authors

D. Welipitiya, University of Nebraska-Lincoln
Y.L. He, University of Nebraska-Lincoln
Jiandi Zhang, Solid State Division, Oak Ridge National LaboratoryFollow
P.I. Oden, Oak Ridge National Laboratory
T. Thundat, Oak Ridge National Laboratory, Oak Ridge, Tennessee
R.J. Warmack, Oak Ridge National Laboratory, Oak Ridge, Tennessee
Ismail Gobulukoglu, University of Nebraska-Lincoln
Z.S. Shan, University of Nebraska-Lincoln
David J. Sellmyer, University of Nebraska-LincolnFollow
Peter A. Dowben, University of Nebraska-LincolnFollow

Date of this Version

4-24-1996

Comments

Published J. Appl. Phys. 80 (1996) 1867-1871. Permission to use.

Abstract

We demonstrate that it is possible to deposit a wide range of magnetic features, using photoassisted selective area organometallic chemical vapor deposition. Large arrays of identical micron-scale Ni features were deposited on a Si(111) wafer by this method. Their magnetic properties were studied by alternating gradient force magnetometry as well as magnetic force microscopy. Our morphological and magnetic measurements show that the structures are spatially well defined, and the magnetic properties are related to the structural shapes of the features. This method can be adapted to the fabrication of smaller-scale magnetic and electronic devices. ©1996 American Institute of Physics.