Optical properties of boron carbide (B₅C) thin films fabricated by plasma-enhanced chemical-vapor deposition

Authors

Ahmad A. Ahmad, University of Nebraska-Lincoln
N.J. Ianno, University of Nebraska-LincolnFollow
P.G. Snyder, University of Nebraska-Lincoln
D. Welipitiya, University of Nebraska-Lincoln
D. Byun, University of Nebraska-Lincoln
Peter A. Dowben, University of Nebraska-LincolnFollow

Date of this Version

June 1996

Comments

Published J. Appl. Phys. 79 (1996) 8643-8647. Permission to use.

Abstract

Variable angle of incidence spectroscopic ellipsometry was used to determine the optical constants near the band edge of boron carbide (B₅C) thin films deposited on glass and n-type Si(111) via plasma-enhanced chemical-vapor deposition. The index of refraction n, the extinction coefficient k, and the absorption coefficient are reported in the photon energy spectrum between 1.24 and 4 eV. Ellipsometry analysis of B₅C films on silicon indicates a graded material, while the optical constants of B₅C on glass are homogeneous. Line shape analyses of absorption data for the films on glass indicate an indirect transition at approximately 0.75 eV and a direct transition at about 1.5 eV. ©1996 American Institute of Physics.