Self-assembled Fe nanowires using organometallic chemical vapor deposition and CaF₂ masks on stepped Si(111)

Authors

J.-L. Lin, University of Wisconsin - Madison
D.Y. Petrovykh, University of Wisconsin - Madison
A. Kirakosian, University of Wisconsin - Madison
H. Rauscher, University of Wisconsin - Madison
F.J. Himpsel, University of Wisconsin - Madison
Peter A. Dowben, University of Nebraska-LincolnFollow

Date of this Version

February 2001

Comments

Published by American Institute of Physics; Applied Physics Letters 78 (2001) 829-831. Copyright 2001. Permission to use.

Abstract

Linear arrays of 3 nm wide Fe stripes with 15 nm spacing are fabricated by self-assembly. They are formed by photolysis of ferrocene that is selectively adsorbed between CaF₂ stripes. An ultraviolet nitrogen laser removes the organic ligands from ferrocene. Arrays of CaF₂ stripes serve as masks, which are self-assembled on a stepped Si(111) surface. Scanning tunneling microscopy is used to investigate the surface morphology during growth. A generalization of this method to other wire materials is discussed.