The process-controlled magnetic properties of nanostructured Co/Ag composite films

Authors

• Sy_Hwang Liou, University of Nebraska-LincolnFollow
• S. Malhotra, University of Nebraska - Lincoln
• Z.S. Shan, University of Nebraska - Lincoln
• David J. Sellmyer, University of Nebraska-LincolnFollow
• S. Nafis, University of Nebraska - Lincoln
• John A. Woollam, University of Nebraska-LincolnFollow
• C.P. Reed, University of Nebraska - Lincoln
• R.J. DeAngelis, University of Nebraska - Lincoln
• G.M. Chow, Center for Bio/Molecular Science and Engineering, Naval Research Laboratory, Washington, DC

Document Type

Article

Date of this Version

11-15-1991

Comments

Published by American Institute of Physics. J. Appl. Phys., 70, 5882(1991). ©1991 American Institute of Physics. Permission to use. http://jap.aip.org/jap/.

Abstract

Nanostructured Co/Ag composite films were prepared by magnetron sputtering using a single target. The average crystallite sizes of Co and Ag in the films depend on the deposition conditions. As the substrate temperature increases from 100 °C to 600 °C, the average Ag crystallite size increases from 39 to 452 Å, and the average Co crystallite size increases from Å in the film with 39 vol. % of Co. The films with 39 vol. % of Co and prepared at 400 °C substrate temperature showed a maximum magnetic coercivity of 565 Oe at 6 K. We have studied the correlation between the structure and magnetic properties of these films.