Published Research - Department of Chemistry


Date of this Version

December 2007


Published in Materials Letters 61:29 (December 2007), pp. 5079-5082. Copyright © 2007 Elsevier B.V. Used by permission.


The syntheses and characterization of both tris(diethylamino)aluminum and tris(diisopropylamino)aluminum are presented in this letter. Characterization includes vapor pressure measurements and comparison of the two non-pyrophoric precursors showing them to be viable alternatives to trimethylaluminum. Ultimately, tris(diisopropyl)aluminum was successful in the atomic layer deposition of alumina thin films.

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