Studies of metallic multilayer structures, optical properties, and oxidation using in situ spectroscopic ellipsometry

Authors

Xiang Gao, University of Nebraska-Lincoln
Jeff Hale, J. A. Woollam Co., Lincoln, Nebraska
Scott Heckens, University of Nebraska-Lincoln
John A. Woollam, University of Nebraska-LincolnFollow

Date of this Version

3-1-1998

Comments

Published in J. Vac. Sci. Technol. A 16(2), Mar/Apr 1998. ©1998 American Vacuum Society. Used by permission.

Abstract

In situ spectroscopic ellipsometry (SE) has been successfully used to accurately measure sputter deposition rates and optical constants of un-oxidized metal layers and to control the growth of magnetic multilayers. The structures include [Co/Cu] _n , [Co/Au] _n , [Co/Ni] _n , [Co/Pd] _n and [Co/Pd/ Au] _n . Layer thickness precision is better than ±0.05 nm for layer thicknesses in the range of 0.2 nm to 10 nm. Closed-loop feedback control of layer thickness is also demonstrated. Good consistency was obtained by comparing the in situ SE results to x-ray diffraction measurements. Dynamic oxidation studies of [Co/Au] _n and [Co/Ni] _n multilayer structures are also presented.