Electrical & Computer Engineering, Department of
Date of this Version
12-10-1996
Citation
United States Patent Patent N.: 5,582,646
Abstract
A method of, and system for applying light beam producing systems, such as ellipsometers, polarimeters, polarized light reflectance and functionally similar systems, such that a beam of light produced thereby is caused to be incident upon a process element at an angle in excess of an associated Brewster angle while enabling the production of a signal sufficiently sensitive to changes in process element parameters, for use in "real-time" process element process monitoring and control, is disclosed. In addition, a process element processing system and electron beam producing system and light beam producing system combination system is taught, wherein the electron beam producing and light beam producing systems are mounted to the process element processing system (typically a (MBE) system), by input and output interface system present at a location appropriate for conventional Reflection High Energy Electron Diffraction (RHEED) systems.