Electrical & Computer Engineering, Department of


Date of this Version



Published in J. Appl. Phys. 82 (9), 1 November 1997. © 1997 American Institute of Physics. Used by permission.


Control of thickness and microstructure is critical in the preparation of ultrathin metallic multilayers for magneto-optic memory, computer read heads, and improved wear surfaces. This paper describes use of in situ spectroscopic ellipsometry to calibrate sputter deposition rates, control layer thicknesses, determine optical constants, and study oxidation rates and processes. In this work, the information gained in situ is used together with ex situ Kerr measurements to determine the complete magneto-optic response including the spectroscopic figure of merit for Co/Pt multilayers.