Graduate Studies
First Advisor
Natale Ianno
Second Advisor
Michael Nastasi
Third Advisor
Craig Zuhlke
Date of this Version
Fall 12-2019
Citation
Mirzokarimov, Mirzojamshed. Boron carbide hetero-isomeric device fabrication by PECVD from isomeric precursor ortho-carborane and meta-carborane. MS Thesis. University of Nebraska, 2019.
Abstract
Boron carbide semiconductor devices have a range of applications. As a neutron voltaic, the device could be used to power deep-space exploratory missions. Instead of the passive dosimetry systems used today, an active solid-state neutron detector could immediately alert workers about radiation hazards. The focus of this thesis is the fabrication of an amorphous boron carbide device by plasma enhanced chemical vapor deposition (PECVD). Isomeric carborane precursors are used to synthesize the amorphous p and n-type layers. Improved operation and handling of the PECVD reactor chamber resulted in a stable plasma capable of increased deposition rate. Therefore, quality and purity of the deposited boron carbide films also increased. X-ray photoelectron spectroscopy (XPS), spectroscopic ellipsometry, and I-V curve measurements were used to characterize the material and electronic properties of the films and devices. Furthermore, metallization and the creation of ohmic contacts with both the n-type and p-type layers were investigated
Advisor: Natale Ianno
Comments
A THESIS Presented to the Faculty of The Graduate College at the University of Nebraska In Partial Fulfillment of Requirements For the Degree of Master of Science, Major: Electrical Engineering, Under the Supervision of Professor Natale Ianno. Lincoln, Nebraska: December 2019
Copyright 2019 Mirzojamshed Mirzokarimov