Honors Program


Date of this Version

Spring 3-12-2018

Document Type



Luth, Christopher. Microstructure of Tungsten Oxide as a function of Controlled Parameters. University of Nebraska-Lincoln. 2018.


Copyright Christopher Luth 2018


The microstructure of Tungsten Oxide is examined under various controlled parameters. Tungsten Oxide was deposited on Silicon, Quartz, and Sapphire substrates using DC sputter deposition. The flow rate, pressure ratio, and substrate temperature were varied during the process. After deposition the thin film was annealed in an oven under one atmosphere of ambient air with the temperature and time varied. By varying these parameters the crystallinity of the Tungsten Oxide thin film can be affected. The effects were characterized by x-ray diffraction. Each parameter has a distinct influence in the final structure of the deposited material.