Date of this Version
United States Patent Tan et al. Patent No.: US 7,618,510 B2
A method of applying a pattern on a topography includes first applying a polymer film to an elastormer member, such as PDMS, to form a pad. The pad is then applied to a substrate having a varying topography under pressure. The polymer film is transferred to the substrate due to the plastic deformation of the polymer film under pressure compared to the elastic deformation of the PDMS member pulls away from the polymer layer, thereby depositing the polymer layer, thereby depositing the polymer layer upon the substrate.