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The deposition of high purity and controlled stoichiometry metal boride thin-film materials has recently received considerable interest. Borane clusters and their corresponding metal complexes are currently Wig investigated in our laboratories for their utility as unique source materials for the formation of metallic boride thin films by MOCVD. Variable composition nickel boride thin films ranging from 0.1 micron to several microns have been prepared. These new materials have been characterized by SEM, AES and XES. The magnetic properties of these new films have been investigated with torque magnetometry and magneto-optic Kerr effect magnetometry.