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Axel Enders Publications
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Document Type
Article
Date of this Version
1995
Abstract
We demonstrate an easy implementation of the cantilever bending beam approach to measure stress during film growth in ultrahigh vacuum. Using a simple and compact optical deflection technique, film stress with sub-monolayer sensitivity can be detected. A stress measurement during FeSi, formation on Si(l11) is presented.
Comments
Published in Rev. Sci. Instrum. 66 (9), September 1995. Copyright 1995 American Institute of Physics. Used by permission.