Authors
Z. S. Shan, HMT Technology Corporation
H. Zeng, Center for Materials Research and Analysis, University of Nebraska, Lincoln
C. X. Zhu, HMT Technology Corporation,
M. Azarisooreh, HMT Technology Corporation,
K. Honardoost, HMT Technology Corporation,
Yi Liu, Center for Materials Research and Analysis, University of Nebraska, LincolnFollow
David J. Sellmyer, University of Nebraska, LincolnFollow
Date of this Version
Spring 4-15-1999
Comments
JOURNAL OF APPLIED PHYSICS VOLUME 85, NUMBER 8 15 APRIL 1999 © 1999 American Institute of Physics. @S0021-8979~99!60608-9#