SELECTIVE AREA DEPOSITION OF CONDUCTING PALLADIUM FILMS ON POLYIMIDE RESINS

Authors

Yoon-Gi Kim, Syracuse University
S. Bialy, Syracuse University
R.W. Miller, Syracuse University
J.T. Spencer, Syracuse University
Peter A. Dowben, University of Nebraska-LincolnFollow
Saswati Datta, International Business Machines

Date of this Version

May 1990

Comments

Published in Ma. Res. Soc. Symp. Proc. Vol. 158. © l990 Materials Research Society. Permission to use.

Abstract

We have demonstrated that the selective area deposition of palladium on polyimide substrates i s possible through the U.V. photolysis of (π - a l l y 1) (π –cyclopentadieny1) palladium. This photolytic deposition process did not result in any apparent damage to either the Ultem 1000 (polyetherimide) or Kapton substrates (polyimide substrates). The resistivity of the palladium films (< 0.1 um) suggests that the films are porous.