Laser CVD and Plasma CVD of CRO₂ Films and Cobalt Doped CRO₂ Films Using Organometallic Precursors

Authors

• Peter A. Dowben, University of Nebraska-LincolnFollow
• Marshall Onellion, Stoughton, Wisconsin

Document Type

Article

Date of this Version

December 1990

Comments

United States Patent Number: 4,980,198

Abstract

Chromium dioxide is deposited as a ferromagnetic layer onto selected portions of a substrate or over the entire substrate. Chromium hexacarbonyl vapor is introduced into a vacuum deposition chamber at e.g. 10 milliTorr and oxygen is introduced at e.g. 15 to 100 milliTorr. A UV laser beam is focused onto the substrate to form the CrO₂ layer photolytically. The CrO₂ layer can also be deposited by RF plasma deposition. This technique can also be employed for depositing MoC₂, WC₂, Mo_2φ3, MoO₂ or WO₂. Magnetic recording or memory devices are produced without the high failure rate typical of the prior art sputtering technique.