Aluminum doping of poly„vinylidene fluoride

Authors

B. Xu, University of Nebraska - Lincoln
C.N. Borca, ersity of Nebraska - Lincoln
Stephen Ducharme, University of NebraskaFollow
A.V. Sorokin, ersity of Nebraska - Lincoln
Peter A. Dowben, University of Nebraska-LincolnFollow
V.M. Fridkin, The Russian Academy of Sciences, Moscow, Russia
S.P. Palto, The Russian Academy of Sciences, Moscow, Russia
N.N. Petukhova, The Russian Academy of Sciences, Moscow, Russia
S.G. Yudin, The Russian Academy of Sciences, Moscow, Russia

Date of this Version

January 2001

Comments

Published by American Institute of Physics. J. Chemical Physics 114, 1866-1869 (2001). © 2001 American Institute of Physics. Permission to use. http://jcp.aip.org/.

Abstract

The interface between aluminum and crystalline copolymer thin film of vinylidene fluoride (70%) with trifluoroethylene (30%) [PVDF-TrFE] has been studied. The ratio of carbon 1s and aluminum 2p core level photoemission peak intensities changes little with increasing emission angle after deposition of 5 Å aluminum on the surface of PVDF-TrFE. This indicates that the distribution of aluminum atoms in the copolymer film is quite uniform in the near surface region and that the interface between PVDF-TrFE and aluminum is not abrupt. There is evidence for changes in photohole screening with aluminum doping within the polymer film.