Aluminum doping of poly„vinylidene fluoride

Authors

• B. Xu, University of Nebraska - Lincoln
• C.N. Borca, ersity of Nebraska - Lincoln
• Stephen Ducharme, University of NebraskaFollow
• A.V. Sorokin, ersity of Nebraska - Lincoln
• Peter A. Dowben, University of Nebraska-LincolnFollow
• V.M. Fridkin, The Russian Academy of Sciences, Moscow, Russia
• S.P. Palto, The Russian Academy of Sciences, Moscow, Russia
• N.N. Petukhova, The Russian Academy of Sciences, Moscow, Russia
• S.G. Yudin, The Russian Academy of Sciences, Moscow, Russia

Document Type

Article

Date of this Version

January 2001

Comments

Published by American Institute of Physics. J. Chemical Physics 114, 1866-1869 (2001). © 2001 American Institute of Physics. Permission to use. http://jcp.aip.org/.

Abstract

The interface between aluminum and crystalline copolymer thin film of vinylidene fluoride (70%) with trifluoroethylene (30%) [PVDF-TrFE] has been studied. The ratio of carbon 1s and aluminum 2p core level photoemission peak intensities changes little with increasing emission angle after deposition of 5 Å aluminum on the surface of PVDF-TrFE. This indicates that the distribution of aluminum atoms in the copolymer film is quite uniform in the near surface region and that the interface between PVDF-TrFE and aluminum is not abrupt. There is evidence for changes in photohole screening with aluminum doping within the polymer film.