Atomic force microscope tip spontaneous retraction from dielectric surfaces under applied electrostatic potential

Authors

S. F. Lyuksyutov, University of Akron
P. B. Paramonov, University of Akron
O. V. Mayevska, University of Akron
M. A. Reagan, University of Akron
E. Sancaktar, University of Akron
R. A. Vaia, Wright-Patterson Air Force Base
S. Juhl, Wright-Patterson Air Force Base

Document Type

Article

Date of this Version

2006

Comments

Published in Ultramicroscopy 106 (2006) 909–913.

Abstract

A time-resolved method for tip’ retraction at µs-scale away from dielectric surfaces has been developed. Analysis of the forces in the system comprising AFM tip, water meniscus, and polymer film suggests that an electrostatic repulsion of the tip from the surface in the double-layered (water and polymer) system, and water condensation in the tip–surface junction are the dominant factors enabling the mechanical work for tip retraction. Nanostructures of 5–80nm height are formed in polymeric surfaces as a result. This interesting physical phenomenon could be used for nanostructures patterning in polymeric materials at enhanced aspect ratio.