Size Effects in Thin Metal Films with Applied Field and Radiation

Authors

John A. Johnson, University of Nebraska-Lincoln

Document Type

Thesis

Date of this Version

5-1967

Citation

Thesis M.S—University of Nebraska—Lincoln, 1967. Department of Electrical Engineering.

Comments

Copyright 1967, the author. Used by permission.

Abstract

The electron scattering at the surfaces of an Au film vacuum-deposited on Bi₂O₃ is analyzed as a function of film thickness using the Fuchs-Sondheimer theory modified to allow for the determination of the scattering parameters separately at each of the film surfaces.The scattering at the air-Au interface becomes less specular as Au film thickness increases.In the analysis the assumption is made that the scattering parameter at the Au- Bi₂O₃ interface is unaffected by variation in Au film thickness. The justification for the assumption is the strong influence of the Bi₂O₃ on the growth characteristic of the Au film.It is known that a given Au film thickness will become continuous when deposited on Bi₂O₃, whereas a film of that same thickness would be discontinuous deposited on bare glass or quartz.

Advisor: N.M. Bashara