Chemical and Biomolecular Engineering Research and Publications
Date of this Version
5-24-1994
Abstract
The present invention relates to a dry process for forming patterns on a substrate. More particularly, the process contemplates coating an unzippable polymer film with a small amount of desirable UV if required on a substrate; laser ablating said film into a desired pattern or mask; screening a conductive or resistive paste onto the substrate through the ablated features of said mask; heating said substrate and mask to the unzipping temperature of said mask; and, vaporizing said mask and UV absorbing dye if present leaving behind the solid of said conductive or resistive past adhered to the substrate in the desired pattern.
Comments
The inventors of this patent are Doany; Fuad E. (Katonah, NY), Grube; Gary W. (Washingtonville, NY), Saraf; Ravi (Lincoln, NE).Any relevant information about this patent can be obtained from the following link of united states patent. United states Patent no.5,314,709