Electrical and Computer Engineering, Department of
Department of Electrical and Computer Engineering: Faculty Publications
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Document Type
Article
Date of this Version
12-1-1989
Abstract
Using monolayer-sensitive variable angle of incidence spectroscopic ellipsometry, the silver oxide growth on a silver mirror, coated with an Al2 O3 or SiO2 protective layer, was investigated. The oxidation was done in a pure oxygen plasma asher. The resulting silver oxide growth was monitored accurately as a function of exposure time in the plasma asher. It was found that silver was converted to silver oxide under the protective coating, during ashing of a sample. The optical constants of a dense silver oxide thin film, created by oxidizing in the asher, were also measured.
Comments
Published in Journal of Applied Physics (December 1, 1989), Volume 66, Issue 11, pp. 5602-5607. Copyrighted by The American Institute of Physics. Used by permission.