APPLICATIONOFSPECTROSCOPIC ELLIPSOMETRY TO IN-STU. REAL-TIME FABRICATION OF MULTIPLE LAYER ALTERNATING HIGH/LOW REFRACTIVE INDEX FILTERS

Authors

Blaine D. Johs, Lincoln, NE
Jeffery S. Hale, Lincoln, NE
John A. Woollam, Lincoln, NEFollow
Craig M. Herzinger, Lincoln, NE

Date of this Version

9-6-2005

Citation

United States Patent Patent No.: US 6,940,595 B1

Abstract

Disclosed is application of oblique angle of incidence, reflection and/or transmission mode spectroscopic ellipsometry PSI and/or DELTA, (including combinations thereof and/or mathematical equivalents), vs. wavelength data to monitor and/or control fabrication of multiple layer high/low refractive index band-pass, band-reject and varied attenuation vs. wavelength filters, either alone or in combination with transmissive non-ellipsometric electromagnetic beam turning point vs. layer data obtained at an essentially normal angle of incidence.