Electrical & Computer Engineering, Department of
Date of this Version
5-29-2012
Citation
Patent No.: US 8,189,190 B2
Abstract
Systems and methods are provided for monitoring materials using ultra fast laser pulses. Ultra fast laser pulses, such as femtosecond or attosecond laser pulses, are applied to the materials and laser pulses that result from interactions between the ultra fast laser pulses and the materials are collected. Spectral content of the resulting pulses is generated and presented. The elemental composition of the materials is determined using the spectral content.
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