Sequential Stretching Lithography

Authors

• Haojing Lin, University of Nebraska - Lincoln
• Ocelio V. Lima, University of Nebraska - Lincoln
• Li Tan, University of Nebraska-LincolnFollow
• Zheng Li, University of Nebraska - Lincoln
• Jiangyu Li, University of WashingtonFollow

Document Type

Article

Date of this Version

2007

Comments

Published in Mater. Res. Soc. Symp. Proc. Vol. 961. Copyright © 2007 Materials Research Society. Used by permission.

Abstract

We developed an embossing/imprinting based nanofabrication technique, dubbed sequential stretching lithography (SSL). In this process, a master pattern is imprinted into an elastomer containing a film of uncured elastomer. The elastomer is cured and then elongated to increase feature density and reduce feature size. Replication of this substrate yields a new master that can be used in further reduction steps. One-dimensional grating features with a pitch size below 200 nm were fabricated from 750 nm-pitch grating lines. This process gives us a faithful pattern miniaturization in all aspects and, as a result, a much effective control on density and dimension regulation.