Chemical vapor deposition of boron and boron nitride from decaborane(l4) ^a)

Authors

Yoon Gi Kim, Syracuse University
Peter A. Dowben, University of Nebraska-LincolnFollow
J.T. Spencer, Syracuse University
G.O. Ramseyer, General Electric CompanyFollow

Date of this Version

July 1989

Comments

Published in the Journal of Vacuum Science and Technology A 7 (4), Jul/Aug 1989. Copyright © 1989 American Vacuum Society. Used by permission. For free online abstracts, see http://www.avs.org/literature.jvst.b.aspx

Abstract

We have investigated photoassisted, plasma enhanced chemical vapor deposition and pyrolytic deposition of boron from decaborane (B₁₀H₁₄) and boron nitride from decaborane combined with nitrogen or ammonia. The use of decaborane for depositing boron and boron nitride thin films is seen as a viable alternative to diborane or boron halides.