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We have demonstrated that the selective area deposition of palladium on polyimide substrates i s possible through the U.V. photolysis of (π - a l l y 1) (π –cyclopentadieny1) palladium. This photolytic deposition process did not result in any apparent damage to either the Ultem 1000 (polyetherimide) or Kapton substrates (polyimide substrates). The resistivity of the palladium films (< 0.1 um) suggests that the films are porous.