DEMONSTRATING THE UTILITY OF BORON BASED PRECURSOR MOLECULES FOR SELECTIVE AREA DEPOSITION IN A SCANNING TUNNELING MICROSCOPE

Authors

• F. Keith Perkins, University of Wisconsin, Madison
• M. Onellion, University of Wisconsin, Madison
• Sunwoo Lee, Syracuse UniversityFollow
• Peter A. Dowben, University of Nebraska-LincolnFollow

Document Type

Article

Date of this Version

May 1992

Comments

Published in Mat. Res. Soc. Symp. Proc. Vol. 236. © l992 Materials Research Society. Permission to use.

Abstract

The scanning tunneling microscope (STM) can be used to selectively deposit material from a gaseous precursor compound. Ultra-small (less than a 100 nm across) spatial dimensions for selective area deposition may be achieved by this means. In this paper we outline a scheme for selecting and designing main group cluster compounds and organometallics for this type of selective area deposition using nido-decaborane(l4) as an example.