Research Papers in Physics and Astronomy


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Published by Am Inst of Physics. J. Appl. Phys. 91, 132908 2007. Copyright 2007. Permission to use.


Gd-doped HfO2 films deposited on silicon substrates undergo a crystallographic change from monoclinic to fluorite (cubic) phase with increasing Gd concentrations. The crystallographic phase change is accompanied by a small increase in the valence bandwidth and in the apparent band offset in the surface region. Electrical measurements show pronounced rectification properties for lightly doped Gd:HfO2 films on p-Si and for heavily-doped Gd:HfO2 films on n-Si, suggesting a crossover from n-type to p -type behavior with increasing doping level.

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