Potential phase control of chromium oxide thin films prepared by laser-initiated organometallic chemical vapor deposition

Authors

Ruihua Cheng, University of Nebraska-Lincoln
C.N. Borca, University of Nebraska-Lincoln
Peter A. Dowben, University of Nebraska-LincolnFollow
Shane Stadler, Naval Research Laboratory, Materials Physics Branch, Washington, D.C.Follow
Y.U. Idzerda, Naval Research Laboratory, Materials Physics Branch, Washington, D.C.

Date of this Version

1-22-2001

Comments

Published Applied Physics Letters 78 (2001) 521-523. Permission to use.

Abstract

We have used laser-initiated chemical vapor deposition to grow the chromium oxide thin films through the oxidation of Cr(CO)₆ in an oxygen environment. While both Cr₂O₃ and CrO₂ are present in the film, the relative weight of each phase depends on the oxygen partial pressure. The Curie temperature of the film increases and approaches the bulk TC of CrO₂ (397 K) as the partial oxygen pressure is increased. © 2001 American Institute of Physics. [DOI: 10.1063/1.1343846]