Department of Physics and Astronomy: Publications and Other Research
Date of this Version
September 1990
Abstract
Depopsition of a boron nitride film is carried out by introducing decaborane and dry nitrogen or ammonia into a plasma-assisted chemical vapor deposition chamber. The nitrogen or ammonia partial pressure should provide an excess over the decarborane pressures for example 200 milliTorr of N2 or NH3 and 50 MilliTorr of B10H14. Other film layers can also be produced starting from decaborane.
Comments
United States Patent Patent Number: 4,957,773