Hartmann characterization of the PEEM-3 aberration-corrected X-ray photoemission electron microscope

Authors

A. Scholl, Lawrence Berkeley National LaboratoryFollow
M. A. Marcus, Lawrence Berkeley National Laboratory
A. Doran, Lawrence Berkeley National Laboratory
J. R. Nasiatka, Lawrence Berkeley National Laboratory
A. T. Young, Lawrence Berkeley National Laboratory
A. A. MacDowell, Lawrence Berkeley National Laboratory
R. Streubel, Lawrence Berkeley National LaboratoryFollow
N. Kent, Lawrence Berkeley National Laboratory
J. Feng, Lawrence Berkeley National Laboratory
W. Wan, Lawrence Berkeley National Laboratory
H. A. Padmore, Lawrence Berkeley National Laboratory

Date of this Version

5-1-2018

Document Type

Article

Citation

Ultramicroscopy 188 (2018) 77–84

https://doi.org/10.1016/j.ultramic.2018.03.010

Comments

Published by Elsevier B.V.

Abstract

Aberration correction by an electron mirror dramatically improves the spatial resolution and transmission of photoemission electron microscopes. We will review the performance of the recently installed aberration corrector of the X-ray Photoemission Electron Microscope PEEM-3 and show a large improvement in the efficiency of the electron optics. Hartmann testing is introduced as a quantitative method to measure the geometrical aberrations of a cathode lens electron microscope. We find that aberration correction leads to an order of magnitude reduction of the spherical aberrations, suggesting that a spatial resolution of below 100 nm is possible at 100% transmission of the optics when using x-rays. We demonstrate this improved performance by imaging test patterns employing element and magnetic contrast.