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Evgeny Tsymbal Publications

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ORCID IDs

K. Eom http://orcid.org/0000-0002-8114-609X

Paudel http://orcid.org/0000-0002-9952-9435

Wang http://orcid.org/0000-0003-3146-5559

Lu http://orcid.org/0000-0003-0580-0229

Yuan http://orcid.org/0000-0001-7384-9767

Tybell http://orcid.org/0000-0003-0787-8476

Gopalan http://orcid.org/0000-0001-6866-3677

Pan http://orcid.org/0000-0002-0965-8568

Gruverman http://orcid.org/0000-0003-0492-2750

Chen http://orcid.org/0000-0003-3359-3781

Tsymbal http://orcid.org/0000-0002-6728-5480

C.-B. Eom http://orcid.org/0000-0002-8854-1439

Document Type

Article

Date of this Version

2021

Citation

Nature Communications (2021) 12: 6784

doi: 10.1038/s41467-021-26660-7

Supplemental materials are available at https://doi.org/10.1038/s41467-021-26660-7

Comments

Copyright 2021, the authors. Open access

License: CC BY 4.0 International

Abstract

The control of the in-plane domain evolution in ferroelectric thin films is not only critical to understanding ferroelectric phenomena but also to enabling functional device fabrication. However, in-plane polarized ferroelectric thin films typically exhibit complicated multidomain states, not desirable for optoelectronic device performance. Here we report a strategy combining interfacial symmetry engineering and anisotropic strain to design singledomain, in-plane polarized ferroelectric BaTiO3 thin films. Theoretical calculations predict the key role of the BaTiO3/PrScO3 (110)O substrate interfacial environment, where anisotropic strain, monoclinic distortions, and interfacial electrostatic potential stabilize a single-variant spontaneous polarization. A combination of scanning transmission electron microscopy, piezoresponse force microscopy, ferroelectric hysteresis loop measurements, and second harmonic generation measurements directly reveals the stabilization of the in-plane quasi-single-domain polarization state. This work offers design principles for engineering in-plane domains of ferroelectric oxide thin films, which is a prerequisite for high performance optoelectronic devices.

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