Temporal Contrast in Ti:Sapphire Lasers: Characterization and Control

Authors

• Marc Nantel, University of Michigan - Ann Arbor
• Jiro Itatani, University of Tokyo, Minato-ku, Tokyo
• An-Chun Tien, University of Michigan - Ann Arbor
• Jerome Faure, University of Michigan - Ann Arbor
• Daniel Kaplan, Alliage Inc., 75005 Paris, France
• Marcel Bouvier, Medox Electro-Optics Inc., Ann Arbor, MI
• Takashi Buma, University of Michigan - Ann Arbor
• Paul Van Rompay, University of Michigan - Ann Arbor
• John Nees, University of Michigan - Ann Arbor
• Peter P. Pronko, University of Michigan - Ann Arbor
• Donald P. Umstadter, University of Nebraska-LincolnFollow
• Gerald A. Mourou, University of Michigan - Ann Arbor

Document Type

Article

Date of this Version

3-1-1998

Comments

IEEE Journal Selected Topics Quantum Electronics 4, 449-458 (1998). Copyright 1998. Permission to use.

Abstract

As ultrafast lasers achieve ever higher focused intensities on target, the problem of ensuring a clean laser-solid interaction becomes more pressing. In this paper, we give concrete examples of the deleterious effects of low-contrast interactions, and address the problem of subpicosecond laser intensity contrast ratio on both characterization and control fronts. We present the new technique of high-dynamic-range plasma-shuttered streak camera contrast measurement, as well as two efficient and relatively inexpensive ways of improving the contrast of short pulse lasers without sacrificing on the output energy: a double-pass Pockels cell (PC), and clean high-energy-pulse seeding of the regenerative amplifier.