Electron Injection by Dephasing Electrons with Laser Fields

Authors

• E. Dodd, Center for Ultrafast Optical Science, University of Michigan, Ann Arbor, MI
• J.K. Kim, Center for Ultrafast Optical Science, University of Michigan, Ann Arbor, MI
• Donald P. Umstadter, University of Nebraska-LincolnFollow

Document Type

Article

Date of this Version

11-20-1999

Comments

Advanced Accelerator Concepts: Eighth Workshop, W. Lawson, C. Bellamy, and D. Brosius, AIP Conference Proceedings (AIP Press, New York, 1999),vol. 472 p. 886. Copyright 1999. Permission to use.

Abstract

The authors seek to review injection concepts for plasma based acceleration. It is shown that regardless of injection mechanism, resultant beams will be similar due to wave structure. Also, most schemes employ the same basic processes, namely the dephasing of electrons by laser fields, and can thus be analyzed with similar approaches.