Fabrication of ferromagnetic and antiferromagnetic chromium oxides by organometallic chemical vapor deposition

Authors

Peter A. Dowben, University of Nebraska-LincolnFollow
Yoon Gi Kim, Syracuse University
S. Baral-Tosh, Syracuse University
G.O. Ramseyer, General Electric Company, Electronics Laboratory, Electronics Park, Syracuse, New York Follow
Chanyong Hwang, University of Wisconsin, Madison
M. Onellion, University of Wisconsin, Madison

Document Type

Article

Date of this Version

May 1990

Comments

Published by American Institute of Physics; J. Appl. Phys. 67 (1990) 5658–5660. Copyright 1990. Permission to use.

Abstract

We have been able to fabricate CrO₂ and Cr₂O₃ from ultraviolet photolytic and plasma-assisted decomposition of Cr(CO) ₆ in an oxygen carrier gas. The composition of these films is uniform in composition and contains little contamination. Using magneto-optic Kerr effect measurements, we have been able to demonstrate that the CrO₂ films are ferromagnetic.