Transparent interconnections formed by rapid single-step fabrication of graphene patterns

Authors

J. B. Park, University of Nebraska-Lincoln
W. Xiong, University of Nebraska-Lincoln
Z. Q. Xie, University of Nebraska-Lincoln
Y. Gao, University of Nebraska-Lincoln
M. Qian, University of Nebraska-LincolnFollow
M. Mitchell, University of Nebraska-Lincoln
M. Mahjouri-Samani, University of Nebraska-Lincoln
Y. S. Zhou, University of Nebraska-LincolnFollow
L. Jiang, Beijing Institute of Technology
Yongfeng Lu, University of Nebraska-LincolnFollow

Document Type

Article

Date of this Version

2011

Citation

APPLIED PHYSICS LETTERS 99, 053103 (2011); doi:10.1063/1.3622660

Comments

Copyright 2011 American Institute of Physics

Abstract

We developed a process to form transparent interconnections using graphene patterns that were synthesized by laser chemical vapor deposition. The number of graphene layers was tightly controlled by laser scan speed. Graphene patterns were fabricated at a high scan speed of up to 200 µm/s with a single-step process. The process time is about a million times faster than the conventional chemical vapor deposition method. The fabricated graphene patterns on nickel foils were directly transferred to desired positions on patterned electrodes. The position-controlled transfer with rapid single-step fabrication of graphene patterns provides an innovative pathway for graphene-based interconnections.