APPLICATION OF INTERMEDIATE WAVELENGTH BAND SPECTROSCOPIC ELLIPSOMETRY TO IN-STU. REAL TIME FABRICATION OF MULTIPLE LAYER ALTERNATING HGHALOW REFRACTIVE INDEX FILTERS

Authors

Blaine D. Johs, Lincoln, NE
Jeffery S. Hale, Lincoln, NE
John A. Woollam, Lincoln, NEFollow
Craig M. Herzinger, Lincoln, NE

Document Type

Article

Date of this Version

11-13-2007

Citation

United States Patent Patent No.: US 7,259,313 B1

Abstract

Disclosed is application of oblique angle of incidence, reflection and/or transmission mode spectroscopic ellipsometry PSI and/or DELTA, (including combinations thereof and/or mathematical equivalents), vs. wavelength data over an intermediate wavelength band range around a pass or reject band, to monitor and/or control fabrication of multiple layer high/low refractive index band-pass, band-reject and varied attenuation vs. wavelength thin film interference filters, either alone or in combination with transmissive non-ellipsometric electromagnetic beam turning point vs. layer data obtained at an essentially normal angle of incidence.