Electrical and Computer Engineering, Department of
Department of Electrical and Computer Engineering: Faculty Publications
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Document Type
Article
Date of this Version
11-13-2007
Citation
United States Patent Patent No.: US 7,259,313 B1
Abstract
Disclosed is application of oblique angle of incidence, reflection and/or transmission mode spectroscopic ellipsometry PSI and/or DELTA, (including combinations thereof and/or mathematical equivalents), vs. wavelength data over an intermediate wavelength band range around a pass or reject band, to monitor and/or control fabrication of multiple layer high/low refractive index band-pass, band-reject and varied attenuation vs. wavelength thin film interference filters, either alone or in combination with transmissive non-ellipsometric electromagnetic beam turning point vs. layer data obtained at an essentially normal angle of incidence.