Electrical and Computer Engineering, Department of
Department of Electrical and Computer Engineering: Faculty Publications
Accessibility Remediation
If you are unable to use this item in its current form due to accessibility barriers, you may request remediation through our remediation request form.
Document Type
Article
Date of this Version
10-16-2007
Citation
Patent N0.: US 7,283,234 B1
Abstract
Improved methodology for monitoring deposition or removal of material to or from a process and/or Wittness substrate Which demonstrates a negative e1 at some Wave length. The method involves detection of changes in P-polarized electromagnetism ellipsometric DELTA at SPR Resonance Angle-of-lncidence (A01) to monitor deposition of and/or removal of minute amounts of materials onto, or from, said process and/or Witness substrate. The methodology can optionally monitor ellipsometric PS1, and involves simultaneously or sequentially applying non-P-polarized electromagnetism at the same angle of incidence, or electromagnetic radiation of any polarization at a different angle-of-incidence and Wavelength to the process or Witt ness substrate and application of conventional ellipsometric analysis.