Selective Nanoshaving of Self-Assembled Monolayers of 2-(4-Pyridylethyl)Triethoxysilane

Authors

Luis G. Rosa, University of Nebraska-LincolnFollow
Jinyue Jiang, University of Nebraska-LincolnFollow
Ocelio V. Lima, University of Nebraska-Lincoln
Jie Xiao, University of Nebraska-LincolnFollow
Emmanuel Utreras, University of Nebraska-Lincoln
Peter A. Dowben, University of Nebraska-LincolnFollow
Li Tan, University of Nebraska-LincolnFollow

Date of this Version

5-15-2009

Comments

Published in Materials Letters 63:12 (May 15, 2009), pp. 961–964; doi 10.1016/j.matlet.2009.01.025 Copyright © 2009 Elsevier B.V. Used by permission.

Abstract

Single molecular layers of 2-(4-pyridylethyl)triethoxysilane have been deposited on native oxide surfaces of silicon, with the triethoxysilylethyl groups towards the silicon oxide interface and pyridine at the surface. It is possible to “shave” or mechanically break the molecular bonds at the alkoxy-silane (Si–C) bond using scanning atomic force microscope, leaving large swaths of surface area cut to a depth of 0.64 ± 0.06 nm, exposing the silicon of the alkoxy-silane ligand. Mechanical cleavage of the pyridine ligand alone is also possible, but more difficult to control selectively.