Preparation of high T_cTl-Ba-Ca-Cu-O thin films by pulsed laser evaporation and Tl²O³ vapor processing

Authors

• B. Johs, University of Nebraska - Lincoln
• D. Thompson, University of Nebraska - LincolnFollow
• N.J. Ianno, University of Nebraska - Lincoln
• John A. Woollam, University of Nebraska-LincolnFollow
• Sy_Hwang Liou, University of Nebraska-LincolnFollow
• A.M. Hermann, University of Arkansas - Fayetteville
• Z.Z. Sheng, University of Arkansas - Fayetteville
• W. Kiehl, University of Arkansas - Fayetteville
• O. Shams, University of Arkansas - Fayetteville
• X. Fei, University of Arkansas - Fayetteville
• L. Sheng, University of Arkansas - Fayetteville
• Y.H. Liu, University of Arkansas - Fayetteville

Document Type

Article

Date of this Version

5-1-1989

Comments

Published by American Institute of Physics. Appl. Phys. Lett. 54, 1810 (1989). © 1989 American Institute of Physics. Permission to use. http://jap.aip.org/jap/.

Abstract

Tl-Ba-Ca-Cu-O superconducting thin films with zero-resistance temperatures up to 115 K have been prepared using a Tl₂O₃ vapor process on Ba-Ca-Cu-O precursor thin films. The Ba-Ca-Cu-O thin films were made by laser deposition on Y-stabilized ZrO₂ substrates. This technique minimizes problems caused by the toxicity of Tl₂ O₃, and its subsequent decomposition to the volatile and toxic Tl₂ O upon heating. Therefore, it may have practical application in the fabrication of high T_c Tl-Ba-Ca-Cu-O superconducting thin-film devices.